By Howard Huff
Even as we tentatively input the nanotechnology period, we're now encountering the fiftieth anniversary of the discovery of the IC. Will silicon remain the pre-eminent fabric and may Moore’s legislations proceed unabated, albeit in a broader financial venue, within the nanotechnology period? This monograph addresses those matters through a second look of the clinical and technological foundations of the micro-electronics period. It additionally positive aspects visionary articles of Nobel laureates.
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Additional resources for Into The Nano Era: Moore's Law Beyond Planar Silicon CMOS
Then a laminated piece of Mylar called rubylith was used to make the initial mask pattern. Rubylith was made of two Mylar films, one clear and one red. A razor-edged knife was used to cut strips of the red Mylar away. Initially this was done by hand. One had to be careful not to cut the clear Mylar underneath so the red Mylar could be pulled away, leaving the final mask pattern. This pattern was then reduced to circuit dimensions to make a mask master. 2. Integration scale measures used in the 1970s SSI MSI LSI VLSI Small Scale Integration Medium Scale Integration Large Scale Integration Very Large Scale Integration <100 Transistors 101–1,000 Transistors 1,001–10,000 Transistors >100,000 Transistors chip produced in volume – and it was a point of hot competition.
D. Hutcheson ing for these reasons. He saw no reason to believe that integration levels of 65,000 components would not be achieved by 1975 and that the pace of a doubling each year would remain constant. He pointed to multilayer metalization and optical lithography as key to achieving these goals. Multilayer metalization meant that single transistors could be wired together to form ICs. But of far greater import was the mention of optical lithography. Prior to the invention of the planar process, the dominant device was known as a mesa transistor.
106, 343 (1946) 2. F. M. R. Burbidge, W. Fowler, Rev. Mod. Phys. 29, 547 (1957) 3. K. Lark-Horowitz, in Proc. Conf. Semiconducting Materials, Reading, UK (Butterworth, London, 1951), p. 47 4. G. Wilkes, in Processing of Semiconductors, ed. A. Jackson. Materials Science and Technology (ed. W. ), vol. 16 (VCH, Weinheim, 1996), p. 19 5. D. Yensen, Elec. J. (March 1921) 6. L. Walter, in The Sorby Centennial Symposium on the History of Metallurgy, ed. S. Smith (Gordon and Breach, New York, 1965), p.
Into The Nano Era: Moore's Law Beyond Planar Silicon CMOS by Howard Huff